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Continuous flow supercritical chemical fluid deposition of optoelectronic quality CdS

Continuous flow supercritical chemical fluid deposition of optoelectronic quality CdS
Continuous flow supercritical chemical fluid deposition of optoelectronic quality CdS
Supercritical chemical fluid deposition (SCFD) has attracted considerable attention recently due to its ability to fill high aspect ratio templates. One technologically relevant example is the damascene process deposition of conformal low-resistivity copper interconnects within the latest generation 32nm node integrated circuits. Furthermore, SCFD technology can be extended to a wide range of metals, including Cu, Ni,[6] Au, Ru, Co, Rh, and Ir into macro- and meso-structured environments for a variety of applications, particularly micro-electronics. More recently SCFD has been demonstrated as uniquely suitable for the deposition of metals, polymers, and elemental semiconductors into "micro-structured" optical fibers enabling a new generation of photonic devices including chemical sensors and optical modulators. The ability to deposit a conformal coating of metals, oxides, and indirect bandgap, elemental semiconductor materials via SCFD inside meso- and micro-scale template structures has been clearly demonstrated, with the depositions yielding continuous tubes, or wires without detectable central voids, ca. 3 nm diam. It is clear that the extension of SCFD to the deposition of optoelectronic quality direct bandgap semiconductors would be a valuable technological advance, with important niche applications.
CdS chalcogenide, continuous flow, semiconductors, supercritical fluids
1521-4095
4115-4119
Yang, Jixin
15b184c3-6dd3-44ce-add1-c2673516becc
Hyde, Jason R.
239d9b15-31f2-4506-9b5c-2990ba17e734
Wilson, James W.
9c8605f6-489d-48f0-b955-0edd097adc8b
Mallik, Kanad
013bdafd-6ae0-463e-89a4-6ef1301c5c2f
Sazio, Pier J.A.
0d6200b5-9947-469a-8e97-9147da8a7158
O'Brien, Paul
d4e8ed00-3b79-4b44-a8ac-3a5d837366b7
Malik, Mohamed A.
7804bd04-b0ce-4b5d-b7f4-f615e93376c1
Afzaal, Mohammad
15c0c0f8-acd5-4e73-9b23-e1aa8f2c42d3
Nguyen, Chinh Q.
02da738b-e353-4dd6-b24c-ad930416b11f
George, Michael W.
09040935-b1da-4a63-ad2e-5ba29e39f80a
Howdle, Steven M.
ec70f53e-a5df-4e99-9da2-f90582dde80b
Smith, David C.
d9b2c02d-b7ea-498b-9ea1-208a1681536f
Yang, Jixin
15b184c3-6dd3-44ce-add1-c2673516becc
Hyde, Jason R.
239d9b15-31f2-4506-9b5c-2990ba17e734
Wilson, James W.
9c8605f6-489d-48f0-b955-0edd097adc8b
Mallik, Kanad
013bdafd-6ae0-463e-89a4-6ef1301c5c2f
Sazio, Pier J.A.
0d6200b5-9947-469a-8e97-9147da8a7158
O'Brien, Paul
d4e8ed00-3b79-4b44-a8ac-3a5d837366b7
Malik, Mohamed A.
7804bd04-b0ce-4b5d-b7f4-f615e93376c1
Afzaal, Mohammad
15c0c0f8-acd5-4e73-9b23-e1aa8f2c42d3
Nguyen, Chinh Q.
02da738b-e353-4dd6-b24c-ad930416b11f
George, Michael W.
09040935-b1da-4a63-ad2e-5ba29e39f80a
Howdle, Steven M.
ec70f53e-a5df-4e99-9da2-f90582dde80b
Smith, David C.
d9b2c02d-b7ea-498b-9ea1-208a1681536f

Yang, Jixin, Hyde, Jason R., Wilson, James W., Mallik, Kanad, Sazio, Pier J.A., O'Brien, Paul, Malik, Mohamed A., Afzaal, Mohammad, Nguyen, Chinh Q., George, Michael W., Howdle, Steven M. and Smith, David C. (2009) Continuous flow supercritical chemical fluid deposition of optoelectronic quality CdS Advanced Materials, 21, (41), pp. 4115-4119. (doi:10.1002/adma.200803751).

Record type: Article

Abstract

Supercritical chemical fluid deposition (SCFD) has attracted considerable attention recently due to its ability to fill high aspect ratio templates. One technologically relevant example is the damascene process deposition of conformal low-resistivity copper interconnects within the latest generation 32nm node integrated circuits. Furthermore, SCFD technology can be extended to a wide range of metals, including Cu, Ni,[6] Au, Ru, Co, Rh, and Ir into macro- and meso-structured environments for a variety of applications, particularly micro-electronics. More recently SCFD has been demonstrated as uniquely suitable for the deposition of metals, polymers, and elemental semiconductors into "micro-structured" optical fibers enabling a new generation of photonic devices including chemical sensors and optical modulators. The ability to deposit a conformal coating of metals, oxides, and indirect bandgap, elemental semiconductor materials via SCFD inside meso- and micro-scale template structures has been clearly demonstrated, with the depositions yielding continuous tubes, or wires without detectable central voids, ca. 3 nm diam. It is clear that the extension of SCFD to the deposition of optoelectronic quality direct bandgap semiconductors would be a valuable technological advance, with important niche applications.

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e-pub ahead of print date: 24 June 2009
Published date: November 2009
Keywords: CdS chalcogenide, continuous flow, semiconductors, supercritical fluids
Organisations: Optoelectronics Research Centre

Identifiers

Local EPrints ID: 78859
URI: http://eprints.soton.ac.uk/id/eprint/78859
ISSN: 1521-4095
PURE UUID: 9ccaf4f9-8f52-4e12-af3c-9821e3274eae
ORCID for Pier J.A. Sazio: ORCID iD orcid.org/0000-0002-6506-9266

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Date deposited: 15 Mar 2010
Last modified: 18 Jul 2017 23:21

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Contributors

Author: Jixin Yang
Author: Jason R. Hyde
Author: James W. Wilson
Author: Kanad Mallik
Author: Pier J.A. Sazio ORCID iD
Author: Paul O'Brien
Author: Mohamed A. Malik
Author: Mohammad Afzaal
Author: Chinh Q. Nguyen
Author: Michael W. George
Author: Steven M. Howdle
Author: David C. Smith

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