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Light induced frustration of etching in Fe doped LiNbO3

Barry, I.E., Eason, R.W. and Cook, G. (1999) Light induced frustration of etching in Fe doped LiNbO3 Applied Surface Science, 143, (1-4), pp. 328-331. (doi:10.1016/S0169-4332(99)00087-2).

Record type: Article


We report the results of light-induced frustration of the normal etching behaviour observed when LiNbO3 is immersed in a solution of HF and HNO3 acids. Light of wavelength 488 nm, from an air-cooled 100 mW Ar ion laser, is incident on the rear surface (+z-face) of a thin Fe-doped LiNbO3 sample, whose front face (-z-face) is in contact with the etchant solution. At power densities of > 100 W /cm2, etching is suppressed through light-induced charge migration. Below this power density, partial suppression occurs, leading to submicron scale features, whose orientation follows the crystal symmetry.

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Published date: April 1999


Local EPrints ID: 78936
ISSN: 0169-4332
PURE UUID: 2b34c098-23ee-4d5f-b154-b63032c65d0f
ORCID for R.W. Eason: ORCID iD

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Date deposited: 11 Mar 2010
Last modified: 18 Jul 2017 23:20

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