Ultra Low silicon substrate noise crosstalk using metal Faraday cages in a silicon-on-insulator technology.
Stefanou, Stefanos, Hamel, John, Bain, J S, Armstrong, M, Gamble, B M, Kraft, Michael and Kemhadjian, Henri (2003) Ultra Low silicon substrate noise crosstalk using metal Faraday cages in a silicon-on-insulator technology. IEEE Transactions on Electron Devices
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| Item Type: | Article |
|---|---|
| Divisions: | Faculty of Physical and Applied Science > Electronics and Computer Science > NANO |
| Item ID: | 257769 |
| Date Deposited: | 12 Mar 2004 |
| Last Modified: | 02 Mar 2012 12:58 |
| Contributors: | Stefanou, Stefanos (Author) Hamel, John (Author) Bain, J S (Author) Armstrong, M (Author) Gamble, B M (Author) Kraft, Michael (Author) Kemhadjian, Henri (Author) |
| Date: | 2003 |
| Status: | Published |
| Further Information: | Google Scholar |
| URI: | http://eprints.soton.ac.uk/id/eprint/257769 |
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