Silicon spin diffusion transistor: materials, physics and device characteristics

Dennis, C L, Tiusan, C, Gregg, J F, Ensell, G and Thompson, S M (2005) Silicon spin diffusion transistor: materials, physics and device characteristics. Journal of Physics D: Applied Physics, 152, (4), 340-354.

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The realisation that eaveryday electronics has ignored the spin of the carrier in favour of its charge is the foundation of the field of spintronics. Starting with simple two-terminal devices based on GMR and tunnel magnetoresistance, the technology has advanced to consider three-terminal devices that aim to combine spin sensitivity with a high current gain and a large current output. These devices require both efficient spin injection and semiconductor fabrication. In this paper, a discussion is presented of the design, operation and characteristics of the only spin transistor that has yielded a current gain greater than one in combination with reasonable output currents

Item Type: Article
Related URLs:
Divisions : Faculty of Physical Sciences and Engineering > Electronics and Computer Science > NANO
ePrint ID: 263360
Accepted Date and Publication Date:
August 2005Published
Date Deposited: 01 Feb 2007
Last Modified: 27 Mar 2014 20:07
Further Information:Google Scholar

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