Study of silicon nanodot formation in pulsed-gas VHF plasma process


Tsuchiya, Yoshishige, Ikezawa, K., Nakatsukasa, T., Inaba, N., Usami, K., Mizuta, Hiroshi and Oda, S. (2007) Study of silicon nanodot formation in pulsed-gas VHF plasma process. At 3rd International Conference on Advanced Materials and Nanotechnology (AMN-3, Wellignton, , p 436.

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Item Type: Conference or Workshop Item (Poster)
Additional Information: Event Dates: February 2007
Divisions: Faculty of Physical Sciences and Engineering > Electronics and Computer Science > NANO
ePrint ID: 266288
Date Deposited: 23 Jul 2008 10:02
Last Modified: 27 Mar 2014 20:11
Further Information:Google Scholar
URI: http://eprints.soton.ac.uk/id/eprint/266288

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