Study of silicon nanodot formation in pulsed-gas VHF plasma process
Tsuchiya, Yoshishige, Ikezawa, K., Nakatsukasa, T., Inaba, N., Usami, K., Mizuta, Hiroshi and Oda, S. (2007) Study of silicon nanodot formation in pulsed-gas VHF plasma process. At 3rd International Conference on Advanced Materials and Nanotechnology (AMN-3, Wellignton, , p 436.
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| Item Type: | Conference or Workshop Item (Poster) |
|---|---|
| Additional Information: | Event Dates: February 2007 |
| Divisions: | Faculty of Physical and Applied Science > Electronics and Computer Science > NANO |
| Item ID: | 266288 |
| Date Deposited: | 23 Jul 2008 10:02 |
| Last Modified: | 02 Mar 2012 13:21 |
| Contributors: | Tsuchiya, Yoshishige (Author) Ikezawa, K. (Author) Nakatsukasa, T. (Author) Inaba, N. (Author) Usami, K. (Author) Mizuta, Hiroshi (Author) Oda, S. (Author) |
| Date: | February 2007 |
| Additional Information: | Event Dates: February 2007 |
| Status: | Published |
| Further Information: | Google Scholar |
| URI: | http://eprints.soton.ac.uk/id/eprint/266288 |
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