Metal-Catalyst-Free Growth of Carbon Nanotubes and Their Application in Field-Effect Transistors


Uchino, Takashi, Ayre, G., Smith, D. C., Hutchison, J. L., Groot, C. H. de and Ashburn, Peter (2011) Metal-Catalyst-Free Growth of Carbon Nanotubes and Their Application in Field-Effect Transistors. Electrochemical and Solid-State Letters, 14, (4), K21-K23.

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Description/Abstract

The metal-catalyst-free growth of carbon nanotubes (CNTs) using chemical vapor deposition and the application in field-effect transistors (FETs) is demonstrated. The CNT growth process used a 3-nm-thick Ge layer on SiO2 that was subsequently annealed to produce Ge nanoparticles. Raman measurements show the presence of radial breathing mode peaks and the absence of the disorder induced D-band, indicating single walled CNTs with a low defect density. The synthesized CNTs are used to fabricate CNTFETs and the best device has a state-of-the-art on/off current ratio of 3×108 and a steep sub-threshold slope of 110 mV/dec.

Item Type: Article
ISSNs: 10114913534829
Keywords: annealing, carbon nanotubes, chemical vapour deposition, elemental semiconductors, field effect transistors, germanium, nanofabrication, nanoparticles, Raman spectra, semiconductor growth, semiconductor nanotubes
Divisions: Faculty of Physical Sciences and Engineering > Electronics and Computer Science > NANO
Item ID: 272001
Date Deposited: 10 Feb 2011 09:24
Last Modified: 02 Mar 2012 13:21
Contributors: Uchino, Takashi (Author)
Ayre, G. (Author)
Smith, D. C. (Author)
Hutchison, J. L. (Author)
Groot, C. H. de (Author)
Ashburn, Peter (Author)
Date: 8 February 2011
Status: Published
Further Information:Google Scholar
ISI Citation Count:1
URI: http://eprints.soton.ac.uk/id/eprint/272001

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