Tsuchiya, Yoshishige, Ikezawa, K., Nakatsukasa, T., Inaba, N., Usami, K., Mizuta, Hiroshi and Oda, S. (2007) Study of silicon nanodot formation in pulsed-gas VHF plasma process. 3rd International Conference on Advanced Materials and Nanotechnology (AMN-3, Wellignton. p 436 .
Record type:
Conference or Workshop Item
(Poster)
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Published date: February 2007
Additional Information:
Event Dates: February 2007
Venue - Dates:
3rd International Conference on Advanced Materials and Nanotechnology (AMN-3, Wellignton, 2007-02-01
Organisations:
Nanoelectronics and Nanotechnology
Identifiers
Local EPrints ID: 266288
URI: http://eprints.soton.ac.uk/id/eprint/266288
PURE UUID: a7a2f573-931f-45ba-8144-c982021ebe4a
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Date deposited: 23 Jul 2008 10:02
Last modified: 14 Mar 2024 08:25
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Contributors
Author:
Yoshishige Tsuchiya
Author:
K. Ikezawa
Author:
T. Nakatsukasa
Author:
N. Inaba
Author:
K. Usami
Author:
Hiroshi Mizuta
Author:
S. Oda
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