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Study of silicon nanodot formation in pulsed-gas VHF plasma process

Study of silicon nanodot formation in pulsed-gas VHF plasma process
Study of silicon nanodot formation in pulsed-gas VHF plasma process
p 436
Tsuchiya, Yoshishige
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Ikezawa, K.
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Nakatsukasa, T.
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Inaba, N.
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Usami, K.
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Mizuta, Hiroshi
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Oda, S.
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Tsuchiya, Yoshishige
5a5178c6-b3a9-4e07-b9b2-9a28e49f1dc2
Ikezawa, K.
9901552c-ba37-48dd-a739-4ce8d551653a
Nakatsukasa, T.
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Inaba, N.
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Usami, K.
f506146b-9864-482a-bc61-1de94522d32c
Mizuta, Hiroshi
f14d5ffc-751b-472b-8dba-c8518c6840b9
Oda, S.
4a88f225-39f6-4c89-a9da-8c35fbfe6fde

Tsuchiya, Yoshishige, Ikezawa, K., Nakatsukasa, T., Inaba, N., Usami, K., Mizuta, Hiroshi and Oda, S. (2007) Study of silicon nanodot formation in pulsed-gas VHF plasma process. 3rd International Conference on Advanced Materials and Nanotechnology (AMN-3, Wellignton. p 436 .

Record type: Conference or Workshop Item (Poster)
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More information

Published date: February 2007
Additional Information: Event Dates: February 2007
Venue - Dates: 3rd International Conference on Advanced Materials and Nanotechnology (AMN-3, Wellignton, 2007-02-01
Organisations: Nanoelectronics and Nanotechnology

Identifiers

Local EPrints ID: 266288
URI: http://eprints.soton.ac.uk/id/eprint/266288
PURE UUID: a7a2f573-931f-45ba-8144-c982021ebe4a

Catalogue record

Date deposited: 23 Jul 2008 10:02
Last modified: 20 Nov 2021 08:32

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Contributors

Author: Yoshishige Tsuchiya
Author: K. Ikezawa
Author: T. Nakatsukasa
Author: N. Inaba
Author: K. Usami
Author: Hiroshi Mizuta
Author: S. Oda

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