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Metal-free plasma-enhanced chemical vapour deposition of large area nanocrystalline graphene

Metal-free plasma-enhanced chemical vapour deposition of large area nanocrystalline graphene
Metal-free plasma-enhanced chemical vapour deposition of large area nanocrystalline graphene
1-10
Schmidt, Marek E.
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Xu, Cigang
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Cooke, Mike
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Mizuta, Hiroshi
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Chong, Harold M.H.
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Schmidt, Marek E.
e4489af8-f4ff-4e8d-b7d2-8ca34cb51445
Xu, Cigang
2b5793e8-f5f6-45c1-bf47-ef03ece60b4f
Cooke, Mike
d3bc4b50-7ebd-41a2-aca8-44f7e7a3124a
Mizuta, Hiroshi
f14d5ffc-751b-472b-8dba-c8518c6840b9
Chong, Harold M.H.
795aa67f-29e5-480f-b1bc-9bd5c0d558e1

Schmidt, Marek E., Xu, Cigang, Cooke, Mike, Mizuta, Hiroshi and Chong, Harold M.H. (2014) Metal-free plasma-enhanced chemical vapour deposition of large area nanocrystalline graphene. Materials Research Express, 1 (2), 1-10. (doi:10.1088/2053-1591/1/2/025031).

Record type: Article
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e-pub ahead of print date: April 2014
Published date: 29 May 2014
Organisations: Nanoelectronics and Nanotechnology

Identifiers

Local EPrints ID: 366354
URI: http://eprints.soton.ac.uk/id/eprint/366354
PURE UUID: 84f27e72-f66c-415d-b515-7cbf00c53343
ORCID for Harold M.H. Chong: ORCID iD orcid.org/0000-0002-7110-5761

Catalogue record

Date deposited: 25 Jun 2014 10:51
Last modified: 15 Mar 2024 03:30

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Contributors

Author: Marek E. Schmidt
Author: Cigang Xu
Author: Mike Cooke
Author: Hiroshi Mizuta
Author: Harold M.H. Chong ORCID iD

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