Fabrication and characterization of suspended oxidised silicon nanowire channels for near zero leakage logic switches
Fabrication and characterization of suspended oxidised silicon nanowire channels for near zero leakage logic switches
Boodhoo, L.
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Crudgington, L.
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Chong, H.M.H
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Tsuchiya, Y.
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Moktadir, Z.
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Hasegawa, T.
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Mizuta, H.
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22 September 2014
Boodhoo, L.
3cb5f3c0-0c1f-4d33-93c4-5c75518e1129
Crudgington, L.
799fda8b-14f4-4e60-bda1-3b7c7f30cc3b
Chong, H.M.H
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Tsuchiya, Y.
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Moktadir, Z.
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Hasegawa, T.
3c8a194b-8477-428c-9f41-8124daca9bf6
Mizuta, H.
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Boodhoo, L., Crudgington, L., Chong, H.M.H, Tsuchiya, Y., Moktadir, Z., Hasegawa, T. and Mizuta, H.
(2014)
Fabrication and characterization of suspended oxidised silicon nanowire channels for near zero leakage logic switches.
40th Conference on Micro and Nano Engineering, Lausanne, Switzerland.
22 - 26 Sep 2014.
Record type:
Conference or Workshop Item
(Paper)
Text
Liam Boodhoo - MNE2014 Abstract - FINAL.pdf
- Accepted Manuscript
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Published date: 22 September 2014
Venue - Dates:
40th Conference on Micro and Nano Engineering, Lausanne, Switzerland, 2014-09-22 - 2014-09-26
Organisations:
Nanoelectronics and Nanotechnology
Identifiers
Local EPrints ID: 367422
URI: http://eprints.soton.ac.uk/id/eprint/367422
PURE UUID: 84d7e2f4-07fe-403c-80f4-5ca5a082d430
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Date deposited: 30 Jul 2014 07:10
Last modified: 15 Mar 2024 03:30
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Contributors
Author:
L. Boodhoo
Author:
L. Crudgington
Author:
H.M.H Chong
Author:
Y. Tsuchiya
Author:
Z. Moktadir
Author:
T. Hasegawa
Author:
H. Mizuta
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