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Fabrication and characterization of suspended oxidised silicon nanowire channels for near zero leakage logic switches

Fabrication and characterization of suspended oxidised silicon nanowire channels for near zero leakage logic switches
Fabrication and characterization of suspended oxidised silicon nanowire channels for near zero leakage logic switches
Boodhoo, L.
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Crudgington, L.
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Chong, H.M.H
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Tsuchiya, Y.
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Moktadir, Z.
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Hasegawa, T.
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Mizuta, H.
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Boodhoo, L.
3cb5f3c0-0c1f-4d33-93c4-5c75518e1129
Crudgington, L.
799fda8b-14f4-4e60-bda1-3b7c7f30cc3b
Chong, H.M.H
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Tsuchiya, Y.
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Moktadir, Z.
d602f778-3c48-4654-aa20-d55c2e55c4b8
Hasegawa, T.
3c8a194b-8477-428c-9f41-8124daca9bf6
Mizuta, H.
f14d5ffc-751b-472b-8dba-c8518c6840b9

Boodhoo, L., Crudgington, L., Chong, H.M.H, Tsuchiya, Y., Moktadir, Z., Hasegawa, T. and Mizuta, H. (2014) Fabrication and characterization of suspended oxidised silicon nanowire channels for near zero leakage logic switches. 40th Conference on Micro and Nano Engineering, Lausanne, Switzerland. 22 - 26 Sep 2014.

Record type: Conference or Workshop Item (Paper)
Text
Liam Boodhoo - MNE2014 Abstract - FINAL.pdf - Accepted Manuscript
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More information

Published date: 22 September 2014
Venue - Dates: 40th Conference on Micro and Nano Engineering, Lausanne, Switzerland, 2014-09-22 - 2014-09-26
Related URLs:
Organisations: Nanoelectronics and Nanotechnology

Identifiers

Local EPrints ID: 367422
URI: http://eprints.soton.ac.uk/id/eprint/367422
PURE UUID: 84d7e2f4-07fe-403c-80f4-5ca5a082d430
ORCID for H.M.H Chong: ORCID iD orcid.org/0000-0002-7110-5761

Catalogue record

Date deposited: 30 Jul 2014 07:10
Last modified: 15 Mar 2024 03:30

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Contributors

Author: L. Boodhoo
Author: L. Crudgington
Author: H.M.H Chong ORCID iD
Author: Y. Tsuchiya
Author: Z. Moktadir
Author: T. Hasegawa
Author: H. Mizuta

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