Oxidation and diffusion processes during annealing of TiSi(V)N films
Oxidation and diffusion processes during annealing of TiSi(V)N films
The degradation of self-lubricant hard coatings applied in tools for high-speed cutting or dry drilling operations occurs by a combination of wear, oxidation and diffusion. The aim of this investigation was to study the effect of V additions on the diffusion processes and on the oxide scale formation during annealing of TiSiVN coatings. Relation of these results with those achieved for a reference Ti0.80Si0.15N coating with similar Si content is also presented. The structure evolution of the Ti0.65Si0.11V0.15N film was assessed by an in-situ hot-XRD device. A dual layer oxide was formed in the case of Ti0.80Si0.15N coating with a protective Si–O layer at an oxide/coating interface; however, in zones of film defects a complex oxide structure was developed. V additions increased the oxidation rate of the coatings as a result of the V ions diffusion throughout the oxide scale, which inhibited the formation of a continuous protective silicon oxide layer
TiSiVN system, structural evolution, oxidation, oxide scale, diffusion processes
120-126
Fernandes, F.
85b7ced5-c89b-47bb-800f-2dc2738b4aa0
Morgiel, J.
2128486b-84d6-426b-9db4-e310827bf99c
Polcar, T.
c669b663-3ba9-4e7b-9f97-8ef5655ac6d2
Cavaleiro, A.
114e42eb-7255-47ef-834d-0546d56d3171
22 May 2015
Fernandes, F.
85b7ced5-c89b-47bb-800f-2dc2738b4aa0
Morgiel, J.
2128486b-84d6-426b-9db4-e310827bf99c
Polcar, T.
c669b663-3ba9-4e7b-9f97-8ef5655ac6d2
Cavaleiro, A.
114e42eb-7255-47ef-834d-0546d56d3171
Fernandes, F., Morgiel, J., Polcar, T. and Cavaleiro, A.
(2015)
Oxidation and diffusion processes during annealing of TiSi(V)N films.
Surface and Coatings Technology, 275, .
(doi:10.1016/j.surfcoat.2015.05.031).
Abstract
The degradation of self-lubricant hard coatings applied in tools for high-speed cutting or dry drilling operations occurs by a combination of wear, oxidation and diffusion. The aim of this investigation was to study the effect of V additions on the diffusion processes and on the oxide scale formation during annealing of TiSiVN coatings. Relation of these results with those achieved for a reference Ti0.80Si0.15N coating with similar Si content is also presented. The structure evolution of the Ti0.65Si0.11V0.15N film was assessed by an in-situ hot-XRD device. A dual layer oxide was formed in the case of Ti0.80Si0.15N coating with a protective Si–O layer at an oxide/coating interface; however, in zones of film defects a complex oxide structure was developed. V additions increased the oxidation rate of the coatings as a result of the V ions diffusion throughout the oxide scale, which inhibited the formation of a continuous protective silicon oxide layer
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Fernandes_Oxidation.pdf
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Accepted/In Press date: 19 May 2015
Published date: 22 May 2015
Keywords:
TiSiVN system, structural evolution, oxidation, oxide scale, diffusion processes
Organisations:
nCATS Group
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Local EPrints ID: 377654
URI: http://eprints.soton.ac.uk/id/eprint/377654
ISSN: 0257-8972
PURE UUID: ed323dd8-3df2-4360-8bcd-5053edc8e6f8
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Date deposited: 18 Jun 2015 10:03
Last modified: 15 Mar 2024 03:40
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Author:
F. Fernandes
Author:
J. Morgiel
Author:
A. Cavaleiro
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