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Oxidation and diffusion processes during annealing of TiSi(V)N films

Oxidation and diffusion processes during annealing of TiSi(V)N films
Oxidation and diffusion processes during annealing of TiSi(V)N films
The degradation of self-lubricant hard coatings applied in tools for high-speed cutting or dry drilling operations occurs by a combination of wear, oxidation and diffusion. The aim of this investigation was to study the effect of V additions on the diffusion processes and on the oxide scale formation during annealing of TiSiVN coatings. Relation of these results with those achieved for a reference Ti0.80Si0.15N coating with similar Si content is also presented. The structure evolution of the Ti0.65Si0.11V0.15N film was assessed by an in-situ hot-XRD device. A dual layer oxide was formed in the case of Ti0.80Si0.15N coating with a protective Si–O layer at an oxide/coating interface; however, in zones of film defects a complex oxide structure was developed. V additions increased the oxidation rate of the coatings as a result of the V ions diffusion throughout the oxide scale, which inhibited the formation of a continuous protective silicon oxide layer
TiSiVN system, structural evolution, oxidation, oxide scale, diffusion processes
0257-8972
120-126
Fernandes, F.
85b7ced5-c89b-47bb-800f-2dc2738b4aa0
Morgiel, J.
2128486b-84d6-426b-9db4-e310827bf99c
Polcar, T.
c669b663-3ba9-4e7b-9f97-8ef5655ac6d2
Cavaleiro, A.
114e42eb-7255-47ef-834d-0546d56d3171
Fernandes, F.
85b7ced5-c89b-47bb-800f-2dc2738b4aa0
Morgiel, J.
2128486b-84d6-426b-9db4-e310827bf99c
Polcar, T.
c669b663-3ba9-4e7b-9f97-8ef5655ac6d2
Cavaleiro, A.
114e42eb-7255-47ef-834d-0546d56d3171

Fernandes, F., Morgiel, J., Polcar, T. and Cavaleiro, A. (2015) Oxidation and diffusion processes during annealing of TiSi(V)N films. Surface and Coatings Technology, 275, 120-126. (doi:10.1016/j.surfcoat.2015.05.031).

Record type: Article

Abstract

The degradation of self-lubricant hard coatings applied in tools for high-speed cutting or dry drilling operations occurs by a combination of wear, oxidation and diffusion. The aim of this investigation was to study the effect of V additions on the diffusion processes and on the oxide scale formation during annealing of TiSiVN coatings. Relation of these results with those achieved for a reference Ti0.80Si0.15N coating with similar Si content is also presented. The structure evolution of the Ti0.65Si0.11V0.15N film was assessed by an in-situ hot-XRD device. A dual layer oxide was formed in the case of Ti0.80Si0.15N coating with a protective Si–O layer at an oxide/coating interface; however, in zones of film defects a complex oxide structure was developed. V additions increased the oxidation rate of the coatings as a result of the V ions diffusion throughout the oxide scale, which inhibited the formation of a continuous protective silicon oxide layer

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Accepted/In Press date: 19 May 2015
Published date: 22 May 2015
Keywords: TiSiVN system, structural evolution, oxidation, oxide scale, diffusion processes
Organisations: nCATS Group

Identifiers

Local EPrints ID: 377654
URI: http://eprints.soton.ac.uk/id/eprint/377654
ISSN: 0257-8972
PURE UUID: ed323dd8-3df2-4360-8bcd-5053edc8e6f8
ORCID for T. Polcar: ORCID iD orcid.org/0000-0002-0863-6287

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Date deposited: 18 Jun 2015 10:03
Last modified: 15 Mar 2024 03:40

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Contributors

Author: F. Fernandes
Author: J. Morgiel
Author: T. Polcar ORCID iD
Author: A. Cavaleiro

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