Lloyd's mirror interference lithography with EUV radiation from a high-harmonic source
Lloyd's mirror interference lithography with EUV radiation from a high-harmonic source
We demonstrate interference lithography using a high-harmonic source. Extreme ultraviolet (EUV) radiation is produced by high-harmonic generation with 800 nm light from a femtosecond Ti:sapphire laser (40 fs pulses, 1 kHz, 2 W average power) in argon gas. Interference patterns created using Lloyd's mirror setup and monochromatized radiation at the 27th harmonic (29 nm) are recorded using a ZEP-520A photoresist, producing features with <200 nm pitch. The effect of the use of femtosecond pulsed EUV radiation on the recorded pattern is investigated. The capability of the high-harmonic source for high-resolution patterning is discussed.
76701
Kim, Hyunsu
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Baksh, Peter
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Odstrčil, Michal
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Miszczak, Magdalena
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Juschkin, Larissa
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Brocklesby, William
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Frey, Jeremy
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Kim, Hyunsu
39359bf5-7ed4-4524-ba57-f8ce78468b5a
Baksh, Peter
578fea83-9a1c-4dd0-b3f6-66f5552f2344
Odstrčil, Michal
b297d3ec-ed42-4709-9f90-7af79d0644c7
Miszczak, Magdalena
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Juschkin, Larissa
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Brocklesby, William
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Frey, Jeremy
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Kim, Hyunsu, Baksh, Peter, Odstrčil, Michal, Miszczak, Magdalena, Juschkin, Larissa, Brocklesby, William and Frey, Jeremy
(2016)
Lloyd's mirror interference lithography with EUV radiation from a high-harmonic source.
Applied Physics Express, 9 (7), .
(doi:10.7567/APEX.9.076701).
Abstract
We demonstrate interference lithography using a high-harmonic source. Extreme ultraviolet (EUV) radiation is produced by high-harmonic generation with 800 nm light from a femtosecond Ti:sapphire laser (40 fs pulses, 1 kHz, 2 W average power) in argon gas. Interference patterns created using Lloyd's mirror setup and monochromatized radiation at the 27th harmonic (29 nm) are recorded using a ZEP-520A photoresist, producing features with <200 nm pitch. The effect of the use of femtosecond pulsed EUV radiation on the recorded pattern is investigated. The capability of the high-harmonic source for high-resolution patterning is discussed.
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Lloyd mirror HHG - submitted version.docx
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10.7567/APEX.9.076701/meta;jsessionid=A2F88ABE75C49CA5DFD98985B772D80F.c2.iopscience.cld.iop.org
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Accepted/In Press date: 25 May 2016
e-pub ahead of print date: 9 June 2016
Organisations:
Chemistry, Optoelectronics Research Centre
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Local EPrints ID: 399387
URI: http://eprints.soton.ac.uk/id/eprint/399387
PURE UUID: 7903899c-ed92-414d-82a2-353e4f7a3cfe
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Date deposited: 12 Aug 2016 13:38
Last modified: 15 Mar 2024 02:41
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Author:
Hyunsu Kim
Author:
Peter Baksh
Author:
Michal Odstrčil
Author:
Magdalena Miszczak
Author:
Larissa Juschkin
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