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Lloyd's mirror interference lithography with EUV radiation from a high-harmonic source

Lloyd's mirror interference lithography with EUV radiation from a high-harmonic source
Lloyd's mirror interference lithography with EUV radiation from a high-harmonic source
We demonstrate interference lithography using a high-harmonic source. Extreme ultraviolet (EUV) radiation is produced by high-harmonic generation with 800 nm light from a femtosecond Ti:sapphire laser (40 fs pulses, 1 kHz, 2 W average power) in argon gas. Interference patterns created using Lloyd's mirror setup and monochromatized radiation at the 27th harmonic (29 nm) are recorded using a ZEP-520A photoresist, producing features with <200 nm pitch. The effect of the use of femtosecond pulsed EUV radiation on the recorded pattern is investigated. The capability of the high-harmonic source for high-resolution patterning is discussed.
76701
Kim, Hyunsu
39359bf5-7ed4-4524-ba57-f8ce78468b5a
Baksh, Peter
578fea83-9a1c-4dd0-b3f6-66f5552f2344
Odstrčil, Michal
b297d3ec-ed42-4709-9f90-7af79d0644c7
Miszczak, Magdalena
7aeee058-080d-498a-9833-37a0dd8c60b0
Juschkin, Larissa
14157640-798a-4f51-ad7b-412ea6ddccb4
Brocklesby, William
c53ca2f6-db65-4e19-ad00-eebeb2e6de67
Frey, Jeremy
ba60c559-c4af-44f1-87e6-ce69819bf23f
Kim, Hyunsu
39359bf5-7ed4-4524-ba57-f8ce78468b5a
Baksh, Peter
578fea83-9a1c-4dd0-b3f6-66f5552f2344
Odstrčil, Michal
b297d3ec-ed42-4709-9f90-7af79d0644c7
Miszczak, Magdalena
7aeee058-080d-498a-9833-37a0dd8c60b0
Juschkin, Larissa
14157640-798a-4f51-ad7b-412ea6ddccb4
Brocklesby, William
c53ca2f6-db65-4e19-ad00-eebeb2e6de67
Frey, Jeremy
ba60c559-c4af-44f1-87e6-ce69819bf23f

Kim, Hyunsu, Baksh, Peter, Odstrčil, Michal, Miszczak, Magdalena, Juschkin, Larissa, Brocklesby, William and Frey, Jeremy (2016) Lloyd's mirror interference lithography with EUV radiation from a high-harmonic source. Applied Physics Express, 9 (7), 76701. (doi:10.7567/APEX.9.076701).

Record type: Article

Abstract

We demonstrate interference lithography using a high-harmonic source. Extreme ultraviolet (EUV) radiation is produced by high-harmonic generation with 800 nm light from a femtosecond Ti:sapphire laser (40 fs pulses, 1 kHz, 2 W average power) in argon gas. Interference patterns created using Lloyd's mirror setup and monochromatized radiation at the 27th harmonic (29 nm) are recorded using a ZEP-520A photoresist, producing features with <200 nm pitch. The effect of the use of femtosecond pulsed EUV radiation on the recorded pattern is investigated. The capability of the high-harmonic source for high-resolution patterning is discussed.

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Accepted/In Press date: 25 May 2016
e-pub ahead of print date: 9 June 2016
Organisations: Chemistry, Optoelectronics Research Centre

Identifiers

Local EPrints ID: 399387
URI: http://eprints.soton.ac.uk/id/eprint/399387
PURE UUID: 7903899c-ed92-414d-82a2-353e4f7a3cfe
ORCID for William Brocklesby: ORCID iD orcid.org/0000-0002-2123-6712
ORCID for Jeremy Frey: ORCID iD orcid.org/0000-0003-0842-4302

Catalogue record

Date deposited: 12 Aug 2016 13:38
Last modified: 18 Feb 2021 16:38

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