Transport properties in silicon nanowire transistors with atomically flat interfaces
Transport properties in silicon nanowire transistors with atomically flat interfaces
1-2
Liu, F.
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Husain, M.K.
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Li, Z.
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Sotto, M.S.H.
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Burt, D.
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Fletcher, J.D.
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Kataoka, M.
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Tsuchiya, Y.
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Saito, S.
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Liu, F.
beec7ff8-5835-4793-981b-fafd99b52549
Husain, M.K.
92db1f76-6760-4cf2-8e30-5d4a602fe15b
Li, Z.
05f14f5e-fc6e-446e-ac52-64be640b5e42
Sotto, M.S.H.
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Burt, D.
49c801a2-fb48-40f2-b72f-f713151b96e6
Fletcher, J.D.
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Kataoka, M.
a29bcc0f-ab52-4812-b81f-994bb04c9ad7
Tsuchiya, Y.
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Saito, S.
14a5d20b-055e-4f48-9dda-267e88bd3fdc
Liu, F., Husain, M.K., Li, Z., Sotto, M.S.H., Burt, D., Fletcher, J.D., Kataoka, M., Tsuchiya, Y. and Saito, S.
(2017)
Transport properties in silicon nanowire transistors with atomically flat interfaces.
2017 1st Electron Devices Technology and Manufacturing Conference (EDTM2017), Toyama, Japan.
28 Feb - 02 Mar 2017.
.
(doi:10.1109/EDTM.2017.7947561).
Record type:
Conference or Workshop Item
(Paper)
Text
Transport-properties-Liu.pdf
- Author's Original
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Submitted date: 5 November 2016
e-pub ahead of print date: 15 June 2017
Venue - Dates:
2017 1st Electron Devices Technology and Manufacturing Conference (EDTM2017), Toyama, Japan, 2017-02-28 - 2017-03-02
Organisations:
Nanoelectronics and Nanotechnology
Identifiers
Local EPrints ID: 402316
URI: http://eprints.soton.ac.uk/id/eprint/402316
PURE UUID: 09431778-ccca-475e-8cff-a844f83624cf
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Date deposited: 28 Nov 2016 13:54
Last modified: 15 Mar 2024 03:43
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Contributors
Author:
F. Liu
Author:
M.K. Husain
Author:
Z. Li
Author:
M.S.H. Sotto
Author:
D. Burt
Author:
J.D. Fletcher
Author:
M. Kataoka
Author:
Y. Tsuchiya
Author:
S. Saito
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