Fabrication of silicon slot waveguides with 10nm wide oxide slot

Debnath, Kapil, Khokhar, Ali, Reed, Graham and Saito, Shinichi (2017) Fabrication of silicon slot waveguides with 10nm wide oxide slot. In 2017 IEEE 14th International Conference on Group IV Photonics (GFP). IEEE.. (doi:10.1109/GROUP4.2017.8082184).

Record type: Conference or Workshop Item (Paper)

Abstract

We propose and demonstrate a fabrication technique to realize extremely narrow dielectric slots in silicon waveguides. Using this method, we have demonstrated a silicon slot waveguide with 10 nm dielectric slot with a measured propagation loss of 13.6 dB/cm.

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Accepted/In Press date: 5 June 2017

e-pub ahead of print date: 26 October 2017

Published date: 26 October 2017

Venue - Dates: 2017 IEEE 14th International Conference on Group IV Photonics (GFP), Berlin, Germany, 2017-08-23 - 2017-08-25

Organisations: Optoelectronics Research Centre, Nanoelectronics and Nanotechnology, Photonic Systems Circuits & Sensors

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Identifiers

Local EPrints ID: 411333

URI: https://eprints.soton.ac.uk/id/eprint/411333

DOI: doi:10.1109/GROUP4.2017.8082184

ISSN: 1949-209X

PURE UUID: 5e2dc2ac-83bc-4a76-8d52-50914946d7e2

ORCID for Shinichi Saito:

orcid.org/0000-0003-1539-1182

Catalogue record

Date deposited: 19 Jun 2017 16:30

Last modified: 10 Dec 2019 01:36

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Contributors

Author: Kapil Debnath

Author: Ali Khokhar

Author: Graham Reed

Author: Shinichi Saito

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