Ultrafast multi-layer subtractive patterning
Ultrafast multi-layer subtractive patterning
Subtractive femtosecond laser machining using multiple pulses with different spatial intensity profiles centred on the same position on a sample has been used to fabricate surface relief structuring. A digital micromirror device was used as an intensity spatial light modulator, with a fixed position relative to the sample, to ensure optimal alignment between successive masks. Up to 50 distinct layers, 335 nm lateral spatial resolution and 2.6 µm maximum depth structures were produced. The lateral dimensions of the structures are approximately 40 µm. Surface relief structuring is shown to match intended depth profiles in a nickel substrate, and highly repeatable stitching of identical features in close proximity is also demonstrated.
11928-11933
Heath, Daniel
d53c269d-90d2-41e6-aa63-a03f8f014d21
Rana, Taimoor
9a291c19-2a08-4bce-a0eb-3a995c8a9607
Bapty, Rupert
73f02e1f-c322-4009-b4fe-8c5a7e489a92
Grant-Jacob, James
c5d144d8-3c43-4195-8e80-edd96bfda91b
Xie, Yunhui
f2c3b0e4-8650-4e04-80e5-04505f45bdd6
Eason, Robert
e38684c3-d18c-41b9-a4aa-def67283b020
Mills, Benjamin
05f1886e-96ef-420f-b856-4115f4ab36d0
30 April 2018
Heath, Daniel
d53c269d-90d2-41e6-aa63-a03f8f014d21
Rana, Taimoor
9a291c19-2a08-4bce-a0eb-3a995c8a9607
Bapty, Rupert
73f02e1f-c322-4009-b4fe-8c5a7e489a92
Grant-Jacob, James
c5d144d8-3c43-4195-8e80-edd96bfda91b
Xie, Yunhui
f2c3b0e4-8650-4e04-80e5-04505f45bdd6
Eason, Robert
e38684c3-d18c-41b9-a4aa-def67283b020
Mills, Benjamin
05f1886e-96ef-420f-b856-4115f4ab36d0
Heath, Daniel, Rana, Taimoor, Bapty, Rupert, Grant-Jacob, James, Xie, Yunhui, Eason, Robert and Mills, Benjamin
(2018)
Ultrafast multi-layer subtractive patterning.
Optics Express, 26 (9), .
(doi:10.1364/OE.26.011928).
Abstract
Subtractive femtosecond laser machining using multiple pulses with different spatial intensity profiles centred on the same position on a sample has been used to fabricate surface relief structuring. A digital micromirror device was used as an intensity spatial light modulator, with a fixed position relative to the sample, to ensure optimal alignment between successive masks. Up to 50 distinct layers, 335 nm lateral spatial resolution and 2.6 µm maximum depth structures were produced. The lateral dimensions of the structures are approximately 40 µm. Surface relief structuring is shown to match intended depth profiles in a nickel substrate, and highly repeatable stitching of identical features in close proximity is also demonstrated.
Text
DMD surface relief OEResubFinal
- Accepted Manuscript
Text
oe-26-9-11928
- Version of Record
More information
Accepted/In Press date: 29 March 2018
e-pub ahead of print date: 24 April 2018
Published date: 30 April 2018
Identifiers
Local EPrints ID: 419451
URI: http://eprints.soton.ac.uk/id/eprint/419451
ISSN: 1094-4087
PURE UUID: 58e33685-463b-421b-966c-262d0aa6e315
Catalogue record
Date deposited: 12 Apr 2018 16:30
Last modified: 16 Mar 2024 04:05
Export record
Altmetrics
Contributors
Author:
Daniel Heath
Author:
Taimoor Rana
Author:
Rupert Bapty
Author:
Yunhui Xie
Download statistics
Downloads from ePrints over the past year. Other digital versions may also be available to download e.g. from the publisher's website.
View more statistics
