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Electrically erasable optical I/O for wafer scale testing of silicon photonic integrated circuits

Electrically erasable optical I/O for wafer scale testing of silicon photonic integrated circuits
Electrically erasable optical I/O for wafer scale testing of silicon photonic integrated circuits
A technique for realizing electrically erasable photonics devices using micro-heaters for localized annealing of lattice defects in silicon is presented. The lattice defects have previously been introduced by ion implantation in order to cause a refractive index change. This technique can be used to fabricate electrically erasable on-chip directional couplers (DCs) and Mach-Zehnder Interferometer (MZI) switches. These devices can be used for wafer scale testing of photonics circuits, allowing testing of individual optical components in a complex photonic integrated circuit, or components for programmable optical circuits, whilst inducing negligible additional optical loss when erased electrically. In this paper, we report the designs and experimental results of fully, rapidly annealing of these devices.
1943-0655
Yu, Xingshi
7fb4e039-1fb0-4c2e-8567-43e97e77c997
Chen, Xia
64f6ab92-ca11-4489-8c03-52bc986209ae
Milošević, Milan
b28da945-84a5-4317-8896-6d9ea6a69589
Yan, Xingzhao
e1f3f636-74e4-42d5-81c7-04feec2b85ba
Saito, Shinichi
14a5d20b-055e-4f48-9dda-267e88bd3fdc
Reed, Graham
ca08dd60-c072-4d7d-b254-75714d570139
Yu, Xingshi
7fb4e039-1fb0-4c2e-8567-43e97e77c997
Chen, Xia
64f6ab92-ca11-4489-8c03-52bc986209ae
Milošević, Milan
b28da945-84a5-4317-8896-6d9ea6a69589
Yan, Xingzhao
e1f3f636-74e4-42d5-81c7-04feec2b85ba
Saito, Shinichi
14a5d20b-055e-4f48-9dda-267e88bd3fdc
Reed, Graham
ca08dd60-c072-4d7d-b254-75714d570139

Yu, Xingshi, Chen, Xia, Milošević, Milan, Yan, Xingzhao, Saito, Shinichi and Reed, Graham (2020) Electrically erasable optical I/O for wafer scale testing of silicon photonic integrated circuits. IEEE Photonics Journal, 12 (5). (doi:10.1109/JPHOT.2020.3027799).

Record type: Review

Abstract

A technique for realizing electrically erasable photonics devices using micro-heaters for localized annealing of lattice defects in silicon is presented. The lattice defects have previously been introduced by ion implantation in order to cause a refractive index change. This technique can be used to fabricate electrically erasable on-chip directional couplers (DCs) and Mach-Zehnder Interferometer (MZI) switches. These devices can be used for wafer scale testing of photonics circuits, allowing testing of individual optical components in a complex photonic integrated circuit, or components for programmable optical circuits, whilst inducing negligible additional optical loss when erased electrically. In this paper, we report the designs and experimental results of fully, rapidly annealing of these devices.

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More information

Accepted/In Press date: 25 September 2020
e-pub ahead of print date: 1 October 2020
Published date: October 2020

Identifiers

Local EPrints ID: 444483
URI: http://eprints.soton.ac.uk/id/eprint/444483
ISSN: 1943-0655
PURE UUID: 5b68ab43-2031-499a-9b95-3de47b99f676
ORCID for Xia Chen: ORCID iD orcid.org/0000-0002-0994-5401
ORCID for Shinichi Saito: ORCID iD orcid.org/0000-0003-1539-1182

Catalogue record

Date deposited: 21 Oct 2020 16:31
Last modified: 22 Oct 2020 16:33

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