Vertical and Lateral Electrodeposition of 2D Material Heterostructures

Abstract

Developing scalable techniques for growing 2D materials and their heterostructures is a major challenge that needs to be overcome before these materials can make an impact in industries. Electroplating (electrodeposition) is an industrially acceptable deposition technique that offers unique advantages. This work is divided into two main parts. First, we demonstrate controlled electrodeposition of uniform and continuous MoS2 and WS2 layers over a large-area and micropatterned graphene electrodes. Second, we present a novel electrode design that enables MoS2 to be grown laterally over insulating substrates, demonstrating lateral photodetector devices based on TiN/MoS2/TiN structure. Our goal is to show that electrodeposition can produce competitive quality of 2D materials which can potentially be scaled to wafer sizes in fabrication industries for device applications.

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Identifiers

ORCID for Yasir Noori: orcid.org/0000-0001-5285-8779

ORCID for Victoria Greenacre: orcid.org/0000-0002-3381-9616

ORCID for Gillian Reid: orcid.org/0000-0001-5349-3468

ORCID for Philip N. Bartlett: orcid.org/0000-0002-7300-6900

ORCID for Kees De Groot: orcid.org/0000-0002-3850-7101

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