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Dataset in support of the journal article 'Low-temperature vanadium dioxide for CMOS integration and flexible polyimide applications'

Dataset in support of the journal article 'Low-temperature vanadium dioxide for CMOS integration and flexible polyimide applications'
Dataset in support of the journal article 'Low-temperature vanadium dioxide for CMOS integration and flexible polyimide applications'
Article published in Optical Materials Express Figure 1: Figure 1a: no associated data. Figure 1b: no associated data. Figure 1c: no associated data. Figure 1d: no associated data. Figure 1e: no associated data. Figure 1f: no associated data. Figure 2:Sheet Fig.2 Raman shift vs different anneal temperature. Figure 3: Figure 3a: Sheet Fig.3(a) XPS data of unannealed sample. Figure 3b: Sheet Fig.3(b) XPS data of 250 °C annealed sample. Figure 3c: Sheet Fig.3(c) XPS data of 300 °C annealed sample. Figure 3d: Sheet Fig.3(d) XPS data of 350 °C annealed sample. Figure 3e: Sheet Fig.3(e) XPS data of 400 °C annealed sample. Figure 4: Figure 4a: Sheet Fig.4(a) FTIR reflectance spectra at different temperatures (250C anneal temperature). Figure 4b: Sheet Fig.4(b) FTIR reflectance spectra at different temperatures (300C anneal temperature). Figure 4c: Sheet Fig.4(c) FTIR reflectance spectra at different temperatures (350C anneal temperature). Figure 4d: Sheet Fig.4(d) FTIR reflectance spectra at different temperatures (400C anneal temperature). Figure 4e: Sheet Fig.4(e) IR emissivity hysteresis for anneals at 300 °C Figure 4f: Sheet Fig.4(f) IR emissivity hysteresis for anneals at 350 °C Figure 5: Figure 5a: no associated data. Figure 5b: Sheet Fig.5(b) Raman shift of Kapton comparing with VO2 and V2O5 reference samples. Figure 5c: Sheet Fig.5(c) FTIR reflectance spectra on Kapton (300C anneal temperature). Figure 5d: Sheet Fig.5(d) IR emissivity hysteresis for Kapton anneals at 300C. Supporting Information Figure S1: no associated data. Figure S2: Sheet Fig.S2, COMSOL simulated FTIR reflectance spectra under different SiO2 thickness.
University of Southampton
Sun, Kai
b7c648a3-7be8-4613-9d4d-1bf937fb487b
Muskens, Otto
2284101a-f9ef-4d79-8951-a6cda5bfc7f9
De Groot, Kees
92cd2e02-fcc4-43da-8816-c86f966be90c
Fang, Xu
96b4b212-496b-4d68-82a4-06df70f94a86
Wheeler, Callum L
3ea40718-efe5-47ff-9bd0-fda171e8b5bb
Du, Yuxin
c7d40636-5d75-47cf-bf22-f60d42484c3e
Sun, Kai
b7c648a3-7be8-4613-9d4d-1bf937fb487b
Muskens, Otto
2284101a-f9ef-4d79-8951-a6cda5bfc7f9
De Groot, Kees
92cd2e02-fcc4-43da-8816-c86f966be90c
Fang, Xu
96b4b212-496b-4d68-82a4-06df70f94a86
Wheeler, Callum L
3ea40718-efe5-47ff-9bd0-fda171e8b5bb
Du, Yuxin
c7d40636-5d75-47cf-bf22-f60d42484c3e

Sun, Kai, Muskens, Otto, De Groot, Kees, Fang, Xu, Wheeler, Callum L and Du, Yuxin (2025) Dataset in support of the journal article 'Low-temperature vanadium dioxide for CMOS integration and flexible polyimide applications'. University of Southampton doi:10.5258/SOTON/D3288 [Dataset]

Record type: Dataset

Abstract

Article published in Optical Materials Express Figure 1: Figure 1a: no associated data. Figure 1b: no associated data. Figure 1c: no associated data. Figure 1d: no associated data. Figure 1e: no associated data. Figure 1f: no associated data. Figure 2:Sheet Fig.2 Raman shift vs different anneal temperature. Figure 3: Figure 3a: Sheet Fig.3(a) XPS data of unannealed sample. Figure 3b: Sheet Fig.3(b) XPS data of 250 °C annealed sample. Figure 3c: Sheet Fig.3(c) XPS data of 300 °C annealed sample. Figure 3d: Sheet Fig.3(d) XPS data of 350 °C annealed sample. Figure 3e: Sheet Fig.3(e) XPS data of 400 °C annealed sample. Figure 4: Figure 4a: Sheet Fig.4(a) FTIR reflectance spectra at different temperatures (250C anneal temperature). Figure 4b: Sheet Fig.4(b) FTIR reflectance spectra at different temperatures (300C anneal temperature). Figure 4c: Sheet Fig.4(c) FTIR reflectance spectra at different temperatures (350C anneal temperature). Figure 4d: Sheet Fig.4(d) FTIR reflectance spectra at different temperatures (400C anneal temperature). Figure 4e: Sheet Fig.4(e) IR emissivity hysteresis for anneals at 300 °C Figure 4f: Sheet Fig.4(f) IR emissivity hysteresis for anneals at 350 °C Figure 5: Figure 5a: no associated data. Figure 5b: Sheet Fig.5(b) Raman shift of Kapton comparing with VO2 and V2O5 reference samples. Figure 5c: Sheet Fig.5(c) FTIR reflectance spectra on Kapton (300C anneal temperature). Figure 5d: Sheet Fig.5(d) IR emissivity hysteresis for Kapton anneals at 300C. Supporting Information Figure S1: no associated data. Figure S2: Sheet Fig.S2, COMSOL simulated FTIR reflectance spectra under different SiO2 thickness.

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Published date: 1 March 2025

Identifiers

Local EPrints ID: 498268
URI: http://eprints.soton.ac.uk/id/eprint/498268
PURE UUID: 545e218a-300a-4a6d-96a1-46906dd75d59
ORCID for Kai Sun: ORCID iD orcid.org/0000-0001-6807-6253
ORCID for Otto Muskens: ORCID iD orcid.org/0000-0003-0693-5504
ORCID for Kees De Groot: ORCID iD orcid.org/0000-0002-3850-7101
ORCID for Xu Fang: ORCID iD orcid.org/0000-0003-1735-2654
ORCID for Yuxin Du: ORCID iD orcid.org/0009-0007-7189-803X

Catalogue record

Date deposited: 13 Feb 2025 17:39
Last modified: 19 Aug 2025 02:02

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Contributors

Creator: Kai Sun ORCID iD
Creator: Otto Muskens ORCID iD
Creator: Kees De Groot ORCID iD
Creator: Xu Fang ORCID iD
Creator: Callum L Wheeler
Creator: Yuxin Du ORCID iD

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