Items where Division is "Faculties (pre 2018 reorg) > Faculty of Physical Sciences and Engineering (pre 2018 reorg) > Electronics & Computer Science (pre 2018 reorg) > Nanoelectronics and Nanotechnology (pre 2018 reorg)
Current Faculties > Faculty of Engineering and Physical Sciences > School of Electronics and Computer Science > Electronics & Computer Science (pre 2018 reorg) > Nanoelectronics and Nanotechnology (pre 2018 reorg)
School of Electronics and Computer Science > Electronics & Computer Science (pre 2018 reorg) > Nanoelectronics and Nanotechnology (pre 2018 reorg)" and Year is 1986
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Number of items: 12.
Type: Other
| 1986
| Item not available on this server.
A model for boron diffusion in p+, n+ and lightly doped silicon - P Champ, N E B Cowern, D J Godfrey, A F Willoughby and A G R Evans
Type: Other
| 1986
| Item not available on this server.
The active control of flexural wave power flow in beams - theory - A R D Curtis, W Redman-White and P A Nelson
Type: Conference or Workshop Item
| 1986
| Item not available on this server.
Type: Conference or Workshop Item
| 1986
| Item not available on this server.
Complete model of piezoresistance in polysilicon for strain gauge applications - P J French and A G R Evans
Type: Other
| 1986
| Item not available on this server.
Type: Other
| 1986
| Item not available on this server.
Type: Other
| 1986
| Item not available on this server.
Non equilibrium effects during RTA of Boron and Arsenic implants in silicon - M J Hart, A G R Evans and G A J Amaratunga
Type: Other
| 1986
| Item not available on this server.
Transient scanning electron beam annealing methods used to study diffusion and defects in implanted silicon - M J Hart, A G R Evans and G A J Amaratunga
Type: Article
| 1986
| Item not available on this server.
The active control of flexural wave power flow in breams - experimental investigations - W Redman-White, A R D Curtis and P A Nelson
Type: Conference or Workshop Item
| 1986
| Item not available on this server.
Type: Other
| 1986
| Item not available on this server.
Diffusion of Boron in heavily doped n-and p-type silicon - A F W Willoughby, A G R Evans, P Champ, K J Yallop and D J Godfrey
Type: Other
| 1986
| Item not available on this server.